⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14884006 | 0.89 | — | — | |
| SCHEMBL6353010 | 0.88 | — | — | |
| SCHEMBL14870857 | 0.87 | — | — | |
| SCHEMBL14870389 | 0.83 | — | — | |
| SCHEMBL14870873 | 0.83 | — | — | |
| SCHEMBL14870868 | 0.82 | — | — | |
| SCHEMBL7009015 | 0.79 | — | — | |
| SCHEMBL14870856 | 0.76 | — | — | |
| SCHEMBL7011491 | 0.76 | — | — | |
| SCHEMBL6352902 | 0.75 | BCHE (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9233945-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20130095424-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-18 | — | — | US | disclosed |