SCHEMBL1492986

SCHEMBL1492986

Cc1cc(N=C=O)cc(C)c1N=C=O

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.50
TRPA1 O75762 1/20 0.50
TDP1 Q9NUW8 2/20 0.39
GABRA1 P14867 1/20 0.39
GABRB2 P47870 1/20 0.39
MAPK1 P28482 1/20 0.39
TSHR P16473 1/20 0.37
CYP1A2 P05177 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30692018 0.94 CYP3A4 (0.46) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL407044 0.87 CYP3A4 (0.58) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL8613707 0.83 CYP3A4 (0.52) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL1413980 0.83 CYP3A4 (0.52) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL1192169 0.83 CYP3A4 (0.42) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL1413990 0.83 CYP3A4 (0.42) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL4306324 0.80 CYP3A4 (0.43) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL11654687 0.80 CYP3A4 (0.50) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL16707536 0.80 CYP3A4 (0.39) CYP3A4TRPA1TDP1GABRA1GABRB2
SCHEMBL1457513 0.79 CYP3A4 (0.39) CYP3A4TRPA1GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4076945-A Method for making urethane-terminated polycarbodiimides and products thereof THE GENERAL TIRE & RUBBER COMPANY (US) 1978-02-28 US claimed
US-20250079526-A1 SECONDARY BATTERY AND ELECTRICAL DEVICE CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) 2025-03-06 US disclosed
EP-4517860-A1 SECONDARY BATTERY AND ELECTRIC DEVICE Contemporary Amperex Technology (Hong Kong) Limited (HK) 2025-03-05 EP disclosed
CN-114206963-B Aqueous polyurethane dispersions 科思创德国股份有限公司 2025-02-14 CN disclosed
CN-119029322-A Secondary battery and electricity utilization device 宁德时代新能源科技股份有限公司 2024-11-26 CN disclosed
WO-2024221426-A1 SECONDARY BATTERY AND ELECTRIC DEVICE 宁德时代新能源科技股份有限公司 2024-10-31 WO disclosed
US-20240150605-A1 PRETREATMENT LIQUID FOR INKJET TEXTILE PRINTING, INK SET, AND TEXTILE PRINTING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2024-05-09 US disclosed
US-20240150604-A1 PRETREATMENT COMPOSITION, PRINT SET, AND TEXTILE PRINTING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2024-05-09 US disclosed
WO-2024084957-A1 POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR COMPONENT AGC株式会社 2024-04-25 WO disclosed
CN-117897424-A Aqueous polyurethane urea dispersions 科思创德国股份有限公司 2024-04-16 CN disclosed
CN-101158812-A Radiation sensitive resin composition and color filter JSR CORP (JP) 2008-04-09 CN disclosed
CN-101124518-A Radiation-sensitive resin composition and color filter JSR CORP (JP) 2008-02-13 CN disclosed
CN-1758077-A Radiation sensitive composition and method for the preparation of the same JSR CORP (JP) 2006-04-12 CN disclosed
CN-1734296-A Radiation inductive combination used for color screen, color screen and color liquid crystal display element JSR CO LTD (JP) 2006-02-15 CN disclosed
CN-1648739-A Radiation sensitive composition for color filter, its preparing method and color filter and color liquid crystal display device JSR CORP (JP) 2005-08-03 CN disclosed
EP-0864927-B1 Water-developable photosensitive resin composition JSR CORP (JP) 2000-12-27 EP disclosed
US-6140017-A LIGHT SENSITIVE POLYMERS FROM ALIPHATIC CONJUGATED DIENES WITH UNSATURATED MONOMER AND BLOCK COPOLYMERS WITH SULFONATE GROUPS PARTICULATE COPOLYMER (1) HAS AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF CARBOXYL JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-0864927-A1 Water-developable photosensitive resin composition JSR Corporation (JP) 1998-09-16 EP disclosed
EP-0427929-A2 Heat-sensitive recording material MITSUBISHI PAPER MILLS, LTD. (JP) 1991-05-22 EP disclosed
US-4076945-A Method for making urethane-terminated polycarbodiimides and products thereof THE GENERAL TIRE & RUBBER COMPANY (US) 1978-02-28 US disclosed