⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29449273 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1494509 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1494309 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL29449275 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1494461 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL3986839 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1494519 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1344984 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL1494464 | 0.97 | TSHR (0.47) | — | |
| SCHEMBL29449233 | 0.97 | TSHR (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108474114-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2018-08-31 | — | — | CN | claimed |
| CN-108026637-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2018-05-11 | — | — | CN | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| CN-119278504-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| CN-119278503-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| WO-2024248021-A1 | FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | disclosed |
| EP-2309563-A1 | COMPOSITION AND LIGHT-EMITTING ELEMENT USING THE COMPOSITION | Sumitomo Chemical Company, Limited (JP) | 2011-04-13 | — | — | EP | disclosed |
| EP-2305772-A1 | COMPOSITION CONTAINING A METAL COMPLEX AND ORGANIC COMPOUND, AND LIGHT EMITTING ELEMENT USING SAID COMPOUND | Sumitomo Chemical Company, Limited (JP) | 2011-04-06 | — | — | EP | disclosed |
| EP-2298828-A1 | POLYMERIC COMPOUND CONTAINING METAL COMPLEX RESIDUE AND ELEMENT COMPRISING SAME | Sumitomo Chemical Company, Limited (JP) | 2011-03-23 | — | — | EP | disclosed |
| US-20100264812-A1 | METAL COMPLEX, LIGHT-EMITTING MATERIAL, AND LIGHT-EMITTING DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100019669-A1 | METAL COMPLEX, POLYMER COMPOUND AND DEVICE CONTAINING THOSE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-01-28 | — | — | US | disclosed |
| EP-2128168-A1 | METAL COMPLEX, POLYMER COMPOUND AND DEVICE CONTAINING THOSE | Sumitomo Chemical Company, Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20090043064-A1 | METAL COMPLEX, POLYMER COMPOUND, AND DEVICE CONTAINING IT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |
| EP-1932851-A1 | METAL COMPLEX, LIGHT-EMITTING MATERIAL, AND LIGHT-EMITTING DEVICE | Sumitomo Chemical Company, Limited (JP) | 2008-06-18 | — | — | EP | disclosed |
| US-4745212-A | ESTERIFICATION OR AMIDATION OF ISOCYANATOCARBOXYL CHLORIDE | BAYER AKTIENGESELLSCHAFT (DE) | 1988-05-17 | — | — | US | disclosed |