⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14984086 | 0.99 | — | — | |
| SCHEMBL14984084 | 0.87 | SCN1A (0.32) | — | |
| SCHEMBL14984081 | 0.86 | — | — | |
| SCHEMBL14984085 | 0.86 | SCN1A (0.32) | — | |
| SCHEMBL47440 | 0.85 | — | — | |
| SCHEMBL14984083 | 0.84 | — | — | |
| SCHEMBL47534 | 0.84 | — | — | |
| SCHEMBL47421 | 0.82 | — | — | |
| SCHEMBL47454 | 0.81 | — | — | |
| SCHEMBL14984070 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9459535-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9164380-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9063416-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8785106-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-20130224658-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130209941-A1 | METHOD OF FORMING PATTERN | TOKYO ELECTRON LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130189619-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130157197-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |