SCHEMBL1503296

SCHEMBL1503296

CC(NO)(NO)NO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL189693 0.74
SCHEMBL122036 0.70
Hydrochloric Acid SCHEMBL283187 0.70
SCHEMBL8074138 0.70
SCHEMBL187181 0.70 GAA (0.35)
SCHEMBL8214060 0.70
Hydrochloric Acid SCHEMBL23531965 0.67
Hydrochloric Acid SCHEMBL11060692 0.67
Water SCHEMBL8199649 0.67
Hydroxyamine SCHEMBL8015019 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12509604-B2 Photocurable aqueous ink composition for inkjet printing SAKATA INX CORPORATION (JP) 2025-12-30 US disclosed
CN-119930824-A Anti-Gal 3 antibodies and methods of use 真和制药有限公司 2025-05-06 CN disclosed
CN-119137156-A Anti-ASGR 1 polypeptides for immune tolerance and methods of use 阿诺基昂股份公司 2024-12-13 CN disclosed
CN-115380085-B Photo-curable aqueous ink composition for inkjet printing 阪田油墨股份有限公司 2024-02-02 CN disclosed
US-20230151238-A1 PHOTOCURABLE AQUEOUS INK COMPOSITION FOR INKJET PRINTING SAKATA INX CORPORATION (JP) 2023-05-18 US disclosed
EP-4140744-A1 INK COMPOSITION FOR PHOTOCURABLE AQUEOUS INKJET PRINTING Sakata INX Corporation (JP) 2023-03-01 EP disclosed
CN-115380085-A Photocurable aqueous ink composition for inkjet printing 阪田油墨股份有限公司 2022-11-22 CN disclosed
WO-2021215341-A1 INK COMPOSITION FOR PHOTOCURABLE AQUEOUS INKJET PRINTING サカタインクス株式会社 (JP) 2021-10-28 WO disclosed
EP-2366744-B1 Ink composition, ink set and image forming method FUJIFILM CORP (JP) 2016-11-02 EP disclosed
US-9016829-B2 Ink composition, ink set, and image forming method FUJIFILM CORPORATION (JP) 2015-04-28 US disclosed
EP-0659038-B1 Etching resist composition, pattern forming method making use of the same, printed-wiring board and its production CANON KK (JP) 2000-03-29 EP disclosed
US-6043215-A Preparation of factor IX AVENTIS BEHRING L.L.C. (US) 2000-03-28 US disclosed
US-6040002-A FORMING PRINTED CIRCUIT PATTERNS, ETCHING COPPER FOIL CANON KABUSHIKI KAISHA (JP) 2000-03-21 US disclosed
EP-0953613-A2 Ink, ink-jet recording method using the same, and photopolymerization initiator CANON KABUSHIKI KAISHA (JP) 1999-11-03 EP disclosed
US-5714326-A GENETIC ENGINEERING; USING POLYMERASE CHAIN REACTION DAWSON ELLIOTT P (US) 1998-02-03 US disclosed
EP-0659038-A2 Etching resist composition, pattern forming method making use of the same, printed-wiring board and its production CANON KABUSHIKI KAISHA (JP) 1995-06-21 EP disclosed
EP-0573605-A4 PREPARATION OF FACTOR IX. RHONE POULENC RORER INT (US) 1994-11-23 EP disclosed
EP-0573605-A1 PREPARATION OF FACTOR IX RHONE-POULENC RORER INTERNATIONAL (HOLDINGS) INC. (US) 1993-12-15 EP disclosed
WO-1992015324-A1 PREPARATION OF FACTOR IX RHONE-POULENC RORER INTERNATIONAL (HOLDINGS) INC. (US) 1992-09-17 WO disclosed
US-5132230-A Primary standard and method of making secondary standards for calibration of glycated protein assays ISOLAB, INC. (US) 1992-07-21 US disclosed