⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12009669 | 0.74 | — | — | |
| SCHEMBL2102956 | 0.72 | TSHR (0.31) | — | |
| SCHEMBL27747854 | 0.70 | — | — | |
| SCHEMBL2100801 | 0.69 | — | — | |
| SCHEMBL2100376 | 0.67 | — | — | |
| SCHEMBL2102685 | 0.67 | — | — | |
| SCHEMBL8281873 | 0.67 | — | — | |
| SCHEMBL2103472 | 0.65 | TSHR (0.31) | — | |
| Bromide SCHEMBL5275086 | 0.64 | — | — | |
| SCHEMBL2459245 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11965111-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| US-10941301-B2 | Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-09 | — | — | US | disclosed |
| US-20200079962-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-12 | — | — | US | disclosed |
| US-20200062968-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-27 | — | — | US | disclosed |
| US-20190203054-A1 | SURFACE TREATMENT METHOD, SURFACE TREATMENT AGENT, AND METHOD FOR FORMING FILM REGION-SELECTIVELY ON SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-20180311622-A1 | PURIFICATION METHOD FOR PURIFYING LIQUID, PURIFICATION METHOD FOR PURIFYING SILICON COMPOUND-CONTAINING LIQUID, METHOD FOR PRODUCING SILYLATING AGENT LIQUID, FILM FORMING MATERIAL OR DIFFUSING AGENT COMPOSITION, FILTER MEDIUM AND FILTER DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-11-01 | — | — | US | disclosed |
| US-10093815-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-10-09 | — | — | US | disclosed |
| US-9868090-B2 | Process for preparing chemical liquid of silylating agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9796879-B2 | Film-forming material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-24 | — | — | US | disclosed |
| US-20170088722-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-30 | — | — | US | disclosed |
| US-20160279578-A1 | PROCESS FOR PREPARING CHEMICAL LIQUID OF SILYLATING AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20150184047-A1 | METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20150044858-A1 | FILM-FORMING MATERIAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-12 | — | — | US | disclosed |
| US-20110054184-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-03 | — | — | US | disclosed |