SCHEMBL1503440

SCHEMBL1503440

C[Si](C)(C)c1c[nH]nn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6900889 0.83
SCHEMBL1093794 0.65
SCHEMBL1285959 0.65
SCHEMBL462713 0.65
SCHEMBL5193 0.65
Ammonia Solution, Strong SCHEMBL5916930 0.63
SCHEMBL1682739 0.63
Hydrochloric Acid SCHEMBL27664581 0.63
SCHEMBL158090 0.63
SCHEMBL28201637 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US claimed
EP-4155375-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION Central Glass Company, Limited (JP) 2023-03-29 EP claimed
EP-4155376-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION Central Glass Company, Limited (JP) 2023-03-29 EP claimed
CN-115699259-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-02-03 CN claimed
CN-115668459-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-01-31 CN claimed
US-20220333241-A1 COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON CONTAINING FILMS VERSUM MATERIALS US, LLC (US) 2022-10-20 US claimed
EP-4013903-A1 COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS Versum Materials US, LLC (US) 2022-06-22 EP claimed
CN-114365265-A Compositions for non-conformal deposition of silicon-containing films and methods of using the same 弗萨姆材料美国有限责任公司 2022-04-15 CN claimed
WO-2021050368-A1 COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
CN-109880088-B Poly (trimethylsilyl) triazole and preparation method and application thereof 苏州大学 2021-03-12 CN claimed
US-8999734-B2 Cyclic amino compounds for low-k silylation AMERICAN AIR LIQUIDE, INC. (US) 2015-04-07 US claimed
EP-2406267-A2 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2012-01-18 EP claimed
US-20100233829-A1 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION AMERICAN AIR LIQUIDE INC. (US) 2010-09-16 US claimed
WO-2010104979-A2 CYCLIC AMINO COMPOUNDS FOR LOW-K SILYLATION L'AIR LIQUIDE - SOCIÉTÉ ANONYME POUR L'ÉTUDE ET L'EXPLOITATION DES PROCÉDES GEORGES CLAUDE (FR) 2010-09-16 WO claimed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US disclosed
US-5371074-A Use of saccharin derivatives as proteolytic enzyme inhibitors STERLING WINTHROP INC. (US) 1994-12-06 US disclosed
US-5236917-A Respiratory system disorders, antiarthritic agents STERLING WINTHROP INC. (US) 1993-08-17 US disclosed
EP-0331395-A1 Process for preparing 2-alpha-methyl-2-beta-(1,2,3-triazol-1-yl)methyl-penam-3-alpha-carboxylic acid derivatives TAIHO PHARMACEUTICAL COMPANY LIMITED (JP) 1989-09-06 EP disclosed