SCHEMBL15034673

SCHEMBL15034673

Cc1cccc(C)c1OC(=O)C12CCC(C)(C(=O)O1)C2(C)C

nearest known ligand 0.63

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.63
POLB P06746 2/20 0.58
ALDH1A1 P00352 3/20 0.54
KMT2A Q03164 3/20 0.52
MEN1 O00255 2/20 0.52
GAA P10253 2/20 0.50
TSHR P16473 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
PTBP1 P26599 1/20 0.48
KDM4E B2RXH2 1/20 0.47
HSD17B10 Q99714 1/20 0.47
MAPT P10636 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25629418 0.85 HTT (0.56) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4124397 0.84 HTT (0.62) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4125898 0.84 HTT (0.62) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4111876 0.83 HTT (0.56) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4111671 0.80 HTT (0.53) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4120036 0.80 HTT (0.58) HTTPOLBALDH1A1GAATSHR
SCHEMBL4120061 0.80 HTT (0.60) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL4119740 0.79 HTT (0.57) HTTPOLBALDH1A1GAATSHR
SCHEMBL4113879 0.78 HTT (0.50) HTTPOLBALDH1A1KMT2AMEN1
SCHEMBL16273774 0.75 HTT (0.60) HTTPOLBALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9063416-B2 Resist composition, method of forming resist pattern and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2015-06-23 US disclosed
US-9063416-B2 Resist composition, method of forming resist pattern and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2015-06-23 US disclosed
US-20130157197-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-06-20 US disclosed
US-20130157197-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-06-20 US disclosed