⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22721340 | 0.82 | — | — | |
| SCHEMBL11729970 | 0.80 | — | — | |
| SCHEMBL554847 | 0.79 | — | — | |
| SCHEMBL12190489 | 0.78 | TSHR (0.30) | — | |
| SCHEMBL11785668 | 0.78 | — | — | |
| SCHEMBL11785017 | 0.76 | — | — | |
| SCHEMBL11784825 | 0.76 | — | — | |
| SCHEMBL504808 | 0.73 | — | — | |
| SCHEMBL28290533 | 0.73 | — | — | |
| SCHEMBL27902460 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2618216-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL CO LTD (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-8836089-B2 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2618216-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical Co., Ltd. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-20130168859-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| CN-103097954-A | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |