Etocarlide

Etocarlide

SCHEMBL1506842

CCOc1ccc(NC(=S)Nc2ccc(OCC)cc2)cc1.[Sm]

nearest known ligand 0.96

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 7/20 0.96
▸ GAA P10253 5/20 0.83
▸ L3MBTL1 Q9Y468 1/20 0.73
▸ ALDH1A1 P00352 8/20 0.68
▸ KDM4E B2RXH2 2/20 0.68
▸ LMNA P02545 5/20 0.67
▸ KMT2A Q03164 5/20 0.64
▸ MEN1 O00255 3/20 0.64
▸ HTT P42858 3/20 0.64
▸ POLB P06746 2/20 0.64
▸ HPGD P15428 2/20 0.64
▸ SMN1; SMN2 Q16637 2/20 0.64
▸ NSD2 O96028 1/20 0.64
▸ BLM P54132 1/20 0.64
▸ NPSR1 Q6W5P4 1/20 0.64
▸ MPI P34949 1/20 0.62
▸ CYP1A2 P05177 1/20 0.62
▸ TDP1 Q9NUW8 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Etocarlide SCHEMBL103618 0.98 MAPT (1.00) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL9263 0.98 MAPT (1.00) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL3799483 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL149602 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL104682 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL3458484 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL20994029 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL20658914 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL21694441 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E
Etocarlide SCHEMBL4340235 0.96 MAPT (0.96) MAPTGAAL3MBTL1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2298714-B1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD MITSUBISHI MATERIALS CORP (JP) 2017-07-05 — — EP disclosed
US-9502636-B2 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof MITSUBISHI MATERIALS CORPORATION (JP) 2016-11-22 — — US disclosed
US-9005358-B2 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof MITSUBISHI MATERIALS CORPORATION (JP) 2015-04-14 — — US disclosed
US-20140349139-A1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF MITSUBISHI MATERIALS CORPORATION (JP) 2014-11-27 — — US disclosed
US-20140349834-A1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF MITSUBISHI MATERIALS CORP (JP) 2014-11-27 — — US disclosed
US-8859051-B2 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film and ferroelectric thin film formed by the method thereof MITSUBISHI MATERIALS CORPORATION (JP) 2014-10-14 — — US disclosed
US-8790538-B2 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof MITSUBISHI MATERIALS CORPORATION (JP) 2014-07-29 — — US disclosed
US-20130295414-A1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF MITSUBISHI MATERIALS CORP (JP) 2013-11-07 — — US disclosed
US-20110177235-A1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FORMING FERROELECTRIC THIN FILM, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD THEREOF MITSUBISHI MATERIALS CORPORATION (JP) 2011-07-21 — — US disclosed
EP-2343268-A1 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof Mitsubishi Materials Corporation (JP) 2011-07-13 — — EP disclosed
US-20110098173-A1 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof STMicroelectronics(Tours) SAS (FR) 2011-04-28 — — US disclosed
EP-2298714-A1 COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION, METHOD FOR FERROELECTRIC THIN FILM FORMATION, AND FERROELECTRIC THIN FILM FORMED BY THE METHOD Mitsubishi Materials Corporation (JP) 2011-03-23 — — EP disclosed
EP-1671984-B9 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL CO (JP) 2009-03-18 — — EP disclosed
EP-1671984-B1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL CO (JP) 2008-03-05 — — EP disclosed
EP-1671984-A1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer Sumitomo Chemical Company, Limited (JP) 2006-06-21 — — EP disclosed
EP-1500668-A1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-01-26 — — EP disclosed
EP-1342734-A1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-09-10 — — EP disclosed
US-6528596-B2 Contacting particles with metal compound selected from compounds of Groups VI, VII and XIV metal elements and compounds of the lanthanide series, then contacting resulting particles with compound having active hydrogen or lewis base SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-04 — — US disclosed
EP-1114832-A1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-11 — — EP disclosed
US-20010007007-A1 Modified particles, catalyst for olefin polymerization using the same, and process of producing olefin polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-05 — — US disclosed
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