SCHEMBL15071022

SCHEMBL15071022

CCC(C)CN1CCNC1

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.36
CHRM5 P08912 1/20 0.34
CHRM3 P20309 1/20 0.34
GRIA1 P42261 1/20 0.31
GRIA2 P42262 1/20 0.31
GRIA3 P42263 1/20 0.31
GRIA4 P48058 1/20 0.31
SIGMAR1 Q99720 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3103675 0.87 SMN1; SMN2 (0.46) SMN1; SMN2CHRM5CHRM3GRIA1GRIA2
SCHEMBL9059950 0.80
SCHEMBL20433323 0.80 CXCR4 (0.46) SMN1; SMN2CHRM5CHRM3SIGMAR1
Hydrochloric Acid SCHEMBL28025694 0.78 SMN1; SMN2 (0.42) SMN1; SMN2CHRM5CHRM3
SCHEMBL9060103 0.78 SMN1; SMN2 (0.46) SMN1; SMN2CHRM5CHRM3
SCHEMBL13555439 0.77 CXCR4 (0.35) CHRM5CHRM3SIGMAR1
SCHEMBL28887352 0.77
SCHEMBL2554356 0.77
SCHEMBL7035852 0.77
SCHEMBL11570592 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170219927-A1 COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2017-08-03 US disclosed
US-20130164694-A1 RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-27 US disclosed