Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.38 |
| ▸ | KDM4A | O75164 | 1/20 | 0.38 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.38 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.37 |
| ▸ | GGPS1 | O95749 | 3/20 | 0.36 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.36 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.34 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.34 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.34 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.34 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.32 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1507432 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507580 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507531 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507417 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507584 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL24925606 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507945 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507450 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL5948909 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 | |
| SCHEMBL1507413 | 1.00 | CHRM2 (0.48) | CHRM2LMNAKDM4CKDM4APHF8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10927319-B2 | Use of a mixture of a complex ester with a monocarboxylic acid to reduce friction | BASF SE (DE) | 2021-02-23 | — | — | US | disclosed |
| US-20190345402-A1 | USE OF A MIXTURE OF A COMPLEX ESTER WITH A MONOCARBOXYLIC ACID TO REDUCE FRICTION | BASF SE (DE) | 2019-11-14 | — | — | US | disclosed |
| US-10465138-B2 | Use of a complex ester to reduce fuel consumption | BASF SE (DE) | 2019-11-05 | — | — | US | disclosed |
| EP-3559173-A1 | USE OF A MIXTURE OF A COMPLEX ESTER WITH A MONOCARBOXYLIC ACID TO REDUCE FRICTION | BASF SE (DE) | 2019-10-30 | — | — | EP | disclosed |
| US-20180305631-A1 | USE OF A COMPLEX ESTER TO REDUCE FUEL CONSUMPTION | BASF SE (DE) | 2018-10-25 | — | — | US | disclosed |
| US-10030206-B2 | Use of a complex ester to reduce fuel consumption | BASF SE (DE) | 2018-07-24 | — | — | US | disclosed |
| WO-2018114350-A1 | USE OF A MIXTURE OF A COMPLEX ESTER WITH A MONOCARBOXYLIC ACID TO REDUCE FRICTION | BASF SE (DE) | 2018-06-28 | — | — | WO | disclosed |
| US-9957455-B2 | Use of a polyalkylene glycol to reduce fuel consumption | BASF SE (DE) | 2018-05-01 | — | — | US | disclosed |
| US-9951288-B2 | Use of an alkoxylated polytetrahydrofuran to reduce fuel consumption | BASF SE (DE) | 2018-04-24 | — | — | US | disclosed |
| EP-2855642-B1 | TERTIARY AMINES FOR REDUCING INJECTOR NOZZLE FOULING IN DIRECT INJECTION SPARK IGNITION ENGINES | BASF SE (DE) | 2018-03-28 | — | — | EP | disclosed |
| EP-2296040-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-6982352-B2 | Process for preparing N-methyldialkylamines from secondary dialkylamines and formaldehyde | CELANESE CHEMICALS EUROPE GMBH (DE) | 2006-01-03 | — | — | US | disclosed |
| US-20040204611-A1 | Process for preparing N-methyldialkylamines from secondary dialkylamines and formaldehyde | OXEA GMBH (DE) | 2004-10-14 | — | — | US | disclosed |
| EP-1466887-A1 | Process for the synthesis of N-methyl-dialkylamines from secundary amines and formaldehyde | Celanese Chemicals Europe GmbH (DE) | 2004-10-13 | — | — | EP | disclosed |
| US-20030186161-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-10-02 | — | — | US | disclosed |
| EP-1273970-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |