SCHEMBL150783

SCHEMBL150783

C1=CC2CC=CC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9517109 0.80
SCHEMBL974598 0.78
SCHEMBL9079161 0.72
SCHEMBL6058705 0.71
SCHEMBL2992700 0.66
SCHEMBL3675158 0.64
SCHEMBL13121654 0.64
SCHEMBL8182966 0.64
SCHEMBL13121750 0.64
SCHEMBL14420178 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1412393-B1 OLEFIN POLYMERIZATION CATALYSTS CONTAINING CHELATING DIANIONIC LIGANDS EQUISTAR CHEM LP (US) 2006-05-03 EP claimed
EP-0052854-B1 POLYPHENYLENE OXIDE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-07-02 EP claimed
EP-0052854-A1 Polyphenylene oxide composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1982-06-02 EP claimed
CN-121586750-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2026-02-27 CN disclosed
WO-2025041813-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY 日産化学株式会社 2025-02-27 WO disclosed
US-20240302744-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION NISSAN CHEMICAL CORPORATION (JP) 2024-09-12 US disclosed
CN-117063129-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2023-11-14 CN disclosed
US-11674053-B2 Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-06-13 US disclosed
WO-2022210960-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION 日産化学株式会社 2022-10-06 WO disclosed
US-20160222248-A1 FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-04 US disclosed
EP-2673304-B1 RUBBER MATERIAL WITH BARRIER MATERIAL FORMED FROM CYCLOOLEFIN COPOLYMERS BASF SE (DE) 2016-02-03 EP disclosed
US-8790753-B2 Rubber material with barrier material made of cycloolefin copolymers BASF SE (DE) 2014-07-29 US disclosed
EP-2611850-B1 BARRIER COATING COMPOSED OF CYCLOOLEFIN COPOLYMERS BASF SE (DE) 2014-07-23 EP disclosed
US-20120205022-A1 RUBBER MATERIAL WITH BARRIER MATERIAL MADE OF CYCLOOLEFIN COPOLYMERS BASF SE (DE) 2012-08-16 US disclosed
US-20120058332-A1 BARRIER COATING MADE OF CYCLOOLEFIN COPOLYMERS BASF SE (DE) 2012-03-08 US disclosed
EP-1412393-B1 OLEFIN POLYMERIZATION CATALYSTS CONTAINING CHELATING DIANIONIC LIGANDS EQUISTAR CHEM LP (US) 2006-05-03 EP disclosed
EP-1412393-A1 OLEFIN POLYMERIZATION CATALYSTS CONTAINING CHELATING DIANIONIC LIGANDS Equistar Chemicals, LP (US) 2004-04-28 EP disclosed
US-6544918-B1 Efficiency EQUISTAR CHEMICALS, LP 2003-04-08 US disclosed
US-20030055276-A1 OLEFIN POLYMERIZATION CATALYSTS CONTAINING CHELATING DIANIONIC LIGANDS EQUISTAR CHEMICALS, LP 2003-03-20 US disclosed
WO-2003008464-A1 OLEFIN POLYMERIZATION CATALYSTS CONTAINING CHELATING DIANIONIC LIGANDS EQUISTAR CHEMICALS, LP (US) 2003-01-30 WO disclosed