⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14001999 | 1.00 | — | — | |
| SCHEMBL16488526 | 0.70 | — | — | |
| SCHEMBL785956 | 0.69 | HMGCR (0.34) | — | |
| SCHEMBL92291 | 0.69 | KDM4E (0.30) | — | |
| SCHEMBL19215185 | 0.69 | KDM4E (0.30) | — | |
| SCHEMBL12190156 | 0.66 | — | — | |
| SCHEMBL9913262 | 0.64 | F2R (0.32) | — | |
| SCHEMBL19412870 | 0.63 | — | — | |
| SCHEMBL24533713 | 0.63 | — | — | |
| SCHEMBL9880116 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| WO-2013111667-A1 | FLUORINE-CONTAINING SULFONIC ACID SALT, FLUORINE-CONTAINING SULFONIC ACID SALT RESIN, RESIST COMPOSITION, AND PATTERN FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2013-08-01 | — | — | WO | disclosed |