Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.36 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | SCN8A | Q9UQD0 | 2/20 | 0.30 |
| ▸ | SCN10A | Q9Y5Y9 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686017 | 0.80 | ATM (0.50) | ATMCYP19A1GRM1SCN9AEPHX2 | |
| SCHEMBL24901086 | 0.78 | ATM (0.47) | ATMCYP19A1GRM1EPHX2SCN8A | |
| SCHEMBL2632928 | 0.78 | ATM (0.51) | ATMCYP19A1GRM1EPHX2SCN8A | |
| SCHEMBL13477593 | 0.76 | ATM (0.50) | ATMCYP19A1GRM1EPHX2SCN8A | |
| SCHEMBL2625697 | 0.76 | ATM (0.47) | ATMCYP19A1GRM1EPHX2 | |
| SCHEMBL107260 | 0.75 | ATM (0.45) | ATMCYP19A1GRM1SCN9A | |
| SCHEMBL17550551 | 0.75 | ATM (0.51) | ATMCYP19A1GRM1EPHX2 | |
| SCHEMBL6770656 | 0.75 | ATM (0.51) | ATMCYP19A1GRM1EPHX2 | |
| SCHEMBL2681182 | 0.74 | ATM (0.44) | ATMCYP19A1GRM1EPHX2 | |
| SCHEMBL15452220 | 0.74 | ATM (0.48) | ATMCYP19A1GRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3745207-A1 | PATTERN-FORMING METHOD USING ELECTRON BEAMS FOR EUV RAYS AND USE OF THIS METHOD FOR FORMING A FINE CIRCUIT OF A SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2013125733-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-29 | — | — | WO | disclosed |