⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2350698 | 0.76 | — | — | |
| SCHEMBL11033059 | 0.73 | — | — | |
| SCHEMBL29487517 | 0.73 | TSHR (0.46) | — | |
| SCHEMBL11070173 | 0.73 | — | — | |
| SCHEMBL29142634 | 0.70 | — | — | |
| SCHEMBL28178943 | 0.70 | — | — | |
| SCHEMBL29912702 | 0.70 | — | — | |
| SCHEMBL14355692 | 0.70 | — | — | |
| SCHEMBL27992593 | 0.70 | — | — | |
| SCHEMBL28377282 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260121095-A1 | Advanced Ion Exchange Membranes And Applications Thereof | WILLIAMS RICHARD KENT (US) | 2026-04-30 | — | — | US | disclosed |
| WO-2025128460-A1 | ADVANCED ION EXCHANGE MEMBRANES AND APPLICATIONS THEREOF | WILLIAMS RICHARD KENT (US) | 2025-06-19 | — | — | WO | disclosed |
| CN-107298647-B | End group is the preparation method of the straight chain perfluoroalkyl vinyl ether of sulfonyl fluoride group | 山东华夏神舟新材料有限公司 | 2019-02-22 | — | — | CN | disclosed |
| CN-107298647-A | End group is the preparation method of the straight chain perfluoroalkyl vinyl ether of sulfonyl fluoride group | 山东华夏神舟新材料有限公司 | 2017-10-27 | — | — | CN | disclosed |
| CN-107286060-A | End group is the preparation method of the perfluoroalkyl vinyl ether of sulfonyl fluoride group | 山东华夏神舟新材料有限公司 | 2017-10-24 | — | — | CN | disclosed |
| CN-103582627-A | Allyl ether-terminated fluoroalkyl sulfinic acids and salts thereof | 3M INNOVATIVE PROPERTIES CO | 2014-02-12 | — | — | CN | disclosed |
| US-8557499-B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |