⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18099100 | 0.87 | — | — | |
| SCHEMBL24248342 | 0.87 | — | — | |
| SCHEMBL22225704 | 0.81 | — | — | |
| SCHEMBL25722375 | 0.80 | — | — | |
| SCHEMBL18758205 | 0.80 | — | — | |
| SCHEMBL12400893 | 0.80 | — | — | |
| SCHEMBL7604250 | 0.80 | — | — | |
| SCHEMBL14299607 | 0.77 | — | — | |
| SCHEMBL6440589 | 0.77 | GCGR (0.35) | — | |
| SCHEMBL18354746 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4194438-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | Samsung Electronics Co., Ltd. (KR) | 2023-06-14 | — | — | EP | disclosed |
| WO-2019188426-A1 | ACOUSTIC WAVE PROBE RESIN MATERIAL, ACOUSTIC LENS, ACOUSTIC WAVE PROBE, ACOUSTIC WAVE MEASURING APPARATUS, ULTRASONIC DIAGNOSTIC APPARATUS, PHOTOACOUSTIC WAVE MEASURING APPARATUS, ULTRASONIC ENDOSCOPE, AND METHOD FOR MANUFACTURING ACOUSTIC LENS | 富士フイルム株式会社 | 2019-10-03 | — | — | WO | disclosed |
| WO-2019157407-A1 | SULFONATED POLY(ARYLENE ETHER) MEMBRANES WITH HIGH MONOVALENT SALT REJECTION EVEN IN THE PRESENCE OF MIXED SALT FEEDS THAT CONTAIN MULTIVALENT SALTS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2019-08-15 | — | — | WO | disclosed |
| WO-2013154210-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-10-17 | — | — | WO | disclosed |