SCHEMBL1532776

SCHEMBL1532776

CCC(O[SiH3])C(Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704053 0.74
SCHEMBL7701950 0.72
SCHEMBL1053927 0.72
SCHEMBL225592 0.70
SCHEMBL229966 0.69
SCHEMBL3481562 0.67
SCHEMBL3482723 0.62
SCHEMBL7171317 0.61
SCHEMBL1532646 0.61
SCHEMBL704255 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5599387-A VAPOR FOR PYROLYTIC DEPOSITION OF SILICON DIOXIDE COMPRISING CARRIER GAS, SOURCE OF OXYGEN, SILICON COMPOUND HAVING SIICON-OXYGEN BOND PPG INDUSTRIES, INC. (US) 1997-02-04 US claimed
US-7897259-B1 Compounds and compositions for coating glass with silicon oxide PPG INDUSTRIES OHIO, INC. (US) 2011-03-01 US disclosed
US-5776236-A INCRESED DEPOSITION RATE PPG INDUSTRIES, INC. (US) 1998-07-07 US disclosed
US-5599387-A VAPOR FOR PYROLYTIC DEPOSITION OF SILICON DIOXIDE COMPRISING CARRIER GAS, SOURCE OF OXYGEN, SILICON COMPOUND HAVING SIICON-OXYGEN BOND PPG INDUSTRIES, INC. (US) 1997-02-04 US disclosed