SCHEMBL153281

SCHEMBL153281

O=S(=O)(O)C(c1ccccc1)S(=O)(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 3/20 0.58
ALDH1A1 P00352 2/20 0.56
TSHR P16473 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CYP2D6 P10635 1/20 0.44
LMNA P02545 3/20 0.44
TDP1 Q9NUW8 2/20 0.44
KDM4E B2RXH2 1/20 0.44
GMNN O75496 1/20 0.44
POLB P06746 1/20 0.44
MAPT P10636 1/20 0.44
HPGD P15428 1/20 0.44
PMP22 Q01453 1/20 0.44
KMT2A Q03164 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
CYP2C19 P33261 1/20 0.43
MAPK1 P28482 1/20 0.42
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
HSD11B1 P28845 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28532023 0.97 SRC (0.56) SRCALDH1A1TSHRSMN1; SMN2CYP2D6
SCHEMBL27862061 0.97 SRC (0.56) SRCALDH1A1TSHRSMN1; SMN2CYP2D6
Hydrochloric Acid SCHEMBL251517 0.97 SRC (0.56) SRCALDH1A1TSHRSMN1; SMN2CYP2D6
Diaminooctane SCHEMBL31657008 0.84 HRH1 (0.47) SRCALDH1A1KDM4ECYP2C19
SCHEMBL31657026 0.84 HRH1 (0.47) SRCALDH1A1KDM4ECYP2C19
SCHEMBL31657010 0.84 HRH1 (0.47) SRCALDH1A1KDM4ECYP2C19
Trolamine SCHEMBL27674917 0.82 SRC (0.43) SRCALDH1A1SMN1; SMN2CYP2D6LMNA
SCHEMBL332332 0.82 SRC (0.56) SRCALDH1A1TSHRSMN1; SMN2CYP2D6
SCHEMBL31656978 0.80 HTR2A (0.51) SRCALDH1A1TSHRSMN1; SMN2CYP2D6
SCHEMBL496890 0.79 SRC (0.58) SRCALDH1A1TSHRSMN1; SMN2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12415930-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12415931-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12398288-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-26 US disclosed
US-20250223485-A1 WELLBORE FLUIDS INCLUDING SHALE INHIBITORS, AND RELATED METHODS SCHLUMBERGER TECHNOLOGY CORPORATION 2025-07-10 US disclosed
CN-119081097-A Preparation method of environment-friendly acid and alkali resistant surfactant 宿玉琪 2024-12-06 CN disclosed
EP-4067437-B1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHINETSU CHEMICAL CO (JP) 2024-08-21 EP disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
EP-4134388-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-15 EP disclosed
WO-2023013448-A1 INKJET HEAD CLEANING SOLUTION 株式会社ダイセル 2023-02-09 WO disclosed
US-20220332957-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-20 US disclosed
WO-1993012097-A1 SYNTHESIS OF POLYAZAMACROCYCLES WITH MORE THAN ONE TYPE OF SIDE-CHAIN CHELATING GROUPS BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 1993-06-24 WO disclosed
US-5091033-A ADHESIVE FOR CERAMICS AND PROCESSES FOR THE BONDING OF CERAMICS USING SAME MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-02-25 US disclosed
EP-0252603-A2 Adhesives for ceramics and processes for the bonding of ceramics using same MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-01-13 EP disclosed
US-4578439-A Styryl pyridine cyanates, styryl pyrazine cyanates and polymers thereof THE DOW CHEMICAL COMPANY (US) 1986-03-25 US disclosed
EP-0066100-B1 METHOD TO IMPROVE SUBBING POLYESTER SUPPORT BASES, SUBBED POLYESTER SUPPORT BASES AND PHOTOGRAPHIC FILMS COMPRISING SAID IMPROVED SUPPORT BASES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-02-26 EP disclosed
US-4540745-A Allyl styryl pyridines and pyrazines and polymers thereof THE DOW CHEMICAL COMPANY (US) 1985-09-10 US disclosed
US-4539377-A HEAT RESISTANCE THE DOW CHEMICAL COMPANY (US) 1985-09-03 US disclosed
US-4424273-A GELATIN, ADDITION POLYMER, VINYL ACETAL POLYMER FROM SULFONIC ACID GROUP-CONTAINING ALDEHYDE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-01-03 US disclosed
EP-0066100-A2 Method to improve subbing polyester support bases, subbed polyester support bases and photographic films comprising said improved support bases MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-12-08 EP disclosed
US-4242275-A Process for the preparation of isomer-free toluene-4-sulfonic acid HOECHST AKTIENGESELLSCHAFT (DE) 1980-12-30 US disclosed