SCHEMBL15328675

SCHEMBL15328675

CC(C)([SiH3])CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1040252 0.70
SCHEMBL1316401 0.67
SCHEMBL1105076 0.67
SCHEMBL2759328 0.67
SCHEMBL2036521 0.67
SCHEMBL681449 0.67
SCHEMBL1053219 0.67
SCHEMBL620238 0.67
SCHEMBL5971195 0.67
SCHEMBL23700990 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140342533-A1 METHOD OF STRAIN AND DEFECT CONTROL IN THIN SEMICONDUCTOR FILMS APPLIED MATERIALS, INC. 2014-11-20 US disclosed
US-20130280891-A1 METHOD AND APPARATUS FOR GERMANIUM TIN ALLOY FORMATION BY THERMAL CVD APPLIED MATERIALS, INC. 2013-10-24 US disclosed
WO-2013158372-A1 METHOD AND APPARATUS FOR GERMANIUM TIN ALLOY FORMATION BY THERMAL CVD APPLIED MATERIALS, INC. (US) 2013-10-24 WO disclosed