⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3372424 | 0.73 | — | — | |
| SCHEMBL7699749 | 0.71 | — | — | |
| SCHEMBL29763138 | 0.69 | — | — | |
| SCHEMBL462822 | 0.67 | — | — | |
| SCHEMBL14583855 | 0.67 | TSHR (0.31) | — | |
| SCHEMBL13321049 | 0.63 | — | — | |
| SCHEMBL24792472 | 0.63 | — | — | |
| SCHEMBL20267968 | 0.63 | — | — | |
| SCHEMBL19423199 | 0.63 | — | — | |
| SCHEMBL5241705 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240234534-A1 | METHODS OF FORMING FINFET DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-07-11 | — | — | US | disclosed |
| US-11955528-B2 | Methods of forming FinFET devices | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-09 | — | — | US | disclosed |
| US-20230032727-A1 | METHODS OF FORMING FINFET DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-02-02 | — | — | US | disclosed |
| US-11489059-B2 | Semiconductor devices, FinFET devices and methods of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-11-01 | — | — | US | disclosed |
| US-20210217870-A1 | SEMICONDUCTOR DEVICES, FINFET DEVICES AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-07-15 | — | — | US | disclosed |
| US-8637390-B2 | Metal gate structures and methods for forming thereof | APPLIED MATERIALS, INC. (US) | 2014-01-28 | — | — | US | disclosed |