⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3468794 | 0.76 | — | — | |
| SCHEMBL23518772 | 0.76 | — | — | |
| SCHEMBL3468797 | 0.76 | — | — | |
| SCHEMBL8973287 | 0.63 | — | — | |
| SCHEMBL13461879 | 0.60 | — | — | |
| SCHEMBL28852321 | 0.60 | — | — | |
| SCHEMBL26292 | 0.60 | — | — | |
| SCHEMBL12847209 | 0.60 | — | — | |
| SCHEMBL10177686 | 0.60 | — | — | |
| SCHEMBL8466052 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9296947-B2 | Plasma etching gas and plasma etching method | ZEON CORPORATION (JP) | 2016-03-29 | — | — | US | disclosed |
| US-20140306146-A1 | PLASMA ETCHING GAS AND PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2014-10-16 | — | — | US | disclosed |
| US-8649434-B2 | Apparatus, method and program enabling improvement of encoding efficiency in encoding images | SONY CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| CN-1353139-A | Polyester resin composition | SUMITOMO CHEMICAL CO (JP) | 2002-06-12 | — | — | CN | disclosed |