⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Perchlorate SCHEMBL3862051 | 0.94 | — | — | |
| Perchlorate SCHEMBL1136490 | 0.93 | — | — | |
| Perchlorate SCHEMBL6611 | 0.93 | — | — | |
| Perchlorate SCHEMBL29453481 | 0.93 | — | — | |
| Perchlorate SCHEMBL29351553 | 0.93 | — | — | |
| Perchlorate SCHEMBL1122990 | 0.86 | — | — | |
| Perchlorate SCHEMBL887035 | 0.86 | — | — | |
| Perchlorate SCHEMBL2802344 | 0.86 | — | — | |
| Perchlorate SCHEMBL321161 | 0.86 | — | — | |
| Perchlorate SCHEMBL8974578 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118458819-A | High-entropy composite oxide and preparation method and application thereof | 西华师范大学 | 2024-08-09 | — | — | CN | claimed |
| CN-118307485-A | Preparation method of diazabicyclononane and decane | 五邑大学 | 2024-07-09 | — | — | CN | claimed |
| CN-117732470-A | High-stability catalyst for synthesizing succinic anhydride, preparation method and application | 中国五环工程有限公司 | 2024-03-22 | — | — | CN | claimed |
| CN-115181232-B | Polyurethane material and preparation method and application thereof | 中国科学院赣江创新研究院 | 2023-11-07 | — | — | CN | claimed |
| CN-114059053-B | Electroless Ni-W-P plating solution and preparation method thereof, ni-W-P plating layer and preparation method thereof | 苏州汉宜纳米新材料有限公司 | 2023-10-10 | — | — | CN | claimed |
| CN-113629225-B | Composite manganese oxide and preparation method and application thereof | 超威电源集团有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-115094544-B | Lanthanum zirconate nano ceramic fiber and preparation method thereof | 中国人民解放军国防科技大学 | 2023-03-14 | — | — | CN | claimed |
| CN-115181232-A | Polyurethane material and preparation method and application thereof | 中国科学院赣江创新研究院 | 2022-10-14 | — | — | CN | claimed |
| CN-115117342-A | High-safety lithium ion battery negative electrode material and preparation and application thereof | 中国科学院大连化学物理研究所 | 2022-09-27 | — | — | CN | claimed |
| CN-115094544-A | Lanthanum zirconate nano ceramic fiber and preparation method thereof | 中国人民解放军国防科技大学 | 2022-09-23 | — | — | CN | claimed |
| CN-114059053-A | Chemical plating Ni-W-P plating solution and preparation method thereof, and Ni-W-P plating layer and preparation method thereof | 苏州汉宜纳米新材料有限公司 | 2022-02-18 | — | — | CN | claimed |
| CN-113629225-A | Composite manganese oxide and preparation method and application thereof | 浙江裕源储能科技有限公司 | 2021-11-09 | — | — | CN | claimed |
| CN-107148664-B | Alkaline earth metal-containing cleaning liquid for cleaning semiconductor element, and method for cleaning semiconductor element using same | 三菱瓦斯化学株式会社 | 2020-12-08 | — | — | CN | claimed |
| EP-3220408-B1 | USE OF ALKALINE EARTH METAL-CONTAINING CLEANING SOLUTION FOR CLEANING SEMICONDUCTOR ELEMENT | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-06-03 | — | — | EP | claimed |
| US-10377978-B2 | Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-08-13 | — | — | US | claimed |
| US-20170335248-A1 | ALKALINE EARTH METAL-CONTAINING CLEANING SOLUTION FOR CLEANING SEMICONDUCTOR ELEMENT, AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2017-11-23 | — | — | US | claimed |
| EP-3220408-A1 | ALKALINE EARTH METAL-CONTAINING CLEANING SOLUTION FOR CLEANING SEMICONDUCTOR ELEMENT, AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-09-20 | — | — | EP | claimed |
| WO-2007001848-A2 | HIGH REFRACTIVE INDEX FLUIDS WITH LOW ABSORPTION FOR IMMERSION LITHOGRAPHY | SACHEM, INC. (US) | 2007-01-04 | — | — | WO | claimed |
| US-6025294-A | COMPOSITION COMPRISING BETA-ZEOLITE CONTAINING LANTHANUM AND MOLYBDENUM AND/OR THEIR OXIDES | PHILLIPS PETROLEUM COMPANY (US) | 2000-02-15 | — | — | US | claimed |
| US-5866741-A | LANTHANUM AND MOLYBDENUM ACTIVITY PROMOTER | PHILLIPS PETROLEUM COMPANY (US) | 1999-02-02 | — | — | US | claimed |