⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22721283 | 0.70 | — | — | |
| SCHEMBL1698996 | 0.70 | — | — | |
| SCHEMBL679523 | 0.70 | — | — | |
| SCHEMBL386479 | 0.68 | — | — | |
| SCHEMBL979853 | 0.67 | — | — | |
| SCHEMBL10629361 | 0.67 | — | — | |
| SCHEMBL22423568 | 0.67 | — | — | |
| SCHEMBL8924834 | 0.67 | — | — | |
| SCHEMBL7628702 | 0.67 | — | — | |
| SCHEMBL9888379 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190155162-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2019-05-23 | — | — | US | disclosed |
| US-9921474-B2 | Pattern-forming method and composition | JSR CORPORATION (JP) | 2018-03-20 | — | — | US | disclosed |
| US-20160291462-A1 | PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT | JSR CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20150253670-A1 | PATTERN-FORMING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8927200-B2 | Double patterning method | JSR CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-20140080066-A1 | DOUBLE PATTERNING METHOD | JSR CORPORATION (JP) | 2014-03-20 | — | — | US | disclosed |