SCHEMBL1553744

SCHEMBL1553744

CCCCCCCCCCCCOCc1cc(N)cc(N)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.45
NOS1 P29475 1/20 0.41
MAPT P10636 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
ALDH1A1 P00352 1/20 0.39
HTT P42858 2/20 0.38
MEN1 O00255 1/20 0.38
THRB P10828 1/20 0.38
KMT2A Q03164 1/20 0.38
NR5A1 Q13285 1/20 0.38
CA1 P00915 8/20 0.37
CA2 P00918 8/20 0.37
CA9 Q16790 7/20 0.37
CA12 O43570 3/20 0.37
CA7 P43166 3/20 0.37
CA14 Q9ULX7 3/20 0.37
CA3 P07451 2/20 0.37
CA4 P22748 2/20 0.37
CA6 P23280 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1553669 1.00 TSHR (0.45) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL1554133 1.00 TSHR (0.45) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL1554494 1.00 TSHR (0.45) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL1553726 1.00 TSHR (0.45) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL1554163 1.00 TSHR (0.45) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL16389754 0.98 TSHR (0.42) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL2131104 0.92 TSHR (0.38) TSHRNOS1MAPTNPC1RAB9A
SCHEMBL2133188 0.84 KDM4E (0.36) TSHRMAPTALDH1A1HTTMEN1
SCHEMBL16390098 0.84 TSHR (0.44) TSHRMAPTNPC1RAB9AALDH1A1
SCHEMBL16389941 0.84 TSHR (0.44) TSHRMAPTNPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US claimed
EP-1329769-B1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2011-04-27 EP disclosed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US disclosed
US-20040048188-A1 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-11 US disclosed
EP-1329769-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-07-23 EP disclosed