⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30558016 | 1.00 | — | — | |
| SCHEMBL15545054 | 1.00 | — | — | |
| SCHEMBL30349410 | 1.00 | — | — | |
| SCHEMBL30349526 | 1.00 | — | — | |
| SCHEMBL4361674 | 1.00 | — | — | |
| SCHEMBL102 | 1.00 | — | — | |
| SCHEMBL87532 | 1.00 | — | — | |
| SCHEMBL23071466 | 0.96 | — | — | |
| SCHEMBL5172156 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL1135990 | 0.96 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2870599-A2 | A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND AN AROMATIC COMPOUND COMPRISING AT LEAST ONE ACID GROUP | BASF SE (DE) | 2015-05-13 | — | — | EP | disclosed |
| WO-2014006546-A2 | A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND AN AROMATIC COMPOUND COMPRISING AT LEAST ONE ACID GROUP | BASF SE (DE) | 2014-01-09 | — | — | WO | disclosed |