⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7259736 | 0.85 | — | — | |
| SCHEMBL30985954 | 0.78 | — | — | |
| SCHEMBL467840 | 0.76 | — | — | |
| SCHEMBL28042309 | 0.76 | TSHR (0.44) | — | |
| SCHEMBL15127299 | 0.76 | — | — | |
| SCHEMBL16497240 | 0.73 | — | — | |
| SCHEMBL17332566 | 0.73 | — | — | |
| SCHEMBL28312385 | 0.73 | — | — | |
| SCHEMBL7908504 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL28032105 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109545424-A | A kind of conductive silver paste and its preparation method and application | 苏州晶银新材料股份有限公司 | 2019-03-29 | — | — | CN | claimed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| CN-114999910-A | Directed deposition on patterned structures | 朗姆研究公司 | 2022-09-02 | — | — | CN | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| CN-110249004-B | Polyimide precursor composition | 东京应化工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-107922733-A | Polyimide precursor composition | 东京应化工业株式会社 | 2018-04-17 | — | — | CN | disclosed |
| CN-107709464-A | Containing silicone resin composition | 东京应化工业株式会社 | 2018-02-16 | — | — | CN | disclosed |
| CN-107429059-A | ENERGY-SENSITIVE RESIN COMPOSITION | 东京应化工业株式会社 | 2017-12-01 | — | — | CN | disclosed |
| EP-2855018-B1 | PROCESS OF PREPARATION OF A CATALYST COMPRISING A GROUP VIII METAL AND SILICON AND PROCESS OF SELECTIVE HYDROGENATION USING THAT CATALYST | IFP ENERGIES NOW (FR) | 2017-10-18 | — | — | EP | disclosed |
| US-9695095-B2 | Process for preparing a catalyst based on a group VIII metal and containing silicon, and a process of selective hydrogenation implementing said catalyst | IFP Energies Nouvelles (FR) | 2017-07-04 | — | — | US | disclosed |
| CN-104302399-B | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP 新能源公司 | 2017-03-22 | — | — | CN | disclosed |
| US-20150141718-A1 | PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON, AND A PROCESS OF SELECTIVE HYDROGENATION IMPLEMENTING SAID CATALYST | IFP Energies Nouvelles (FR) | 2015-05-21 | — | — | US | disclosed |
| EP-2855018-A1 | PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON AND SELECTIVE HYDROGENATION PROCESS USING SAID CATALYST | IFP Energies nouvelles (FR) | 2015-04-08 | — | — | EP | disclosed |
| CN-104302399-A | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP Energies Nouvelles | 2015-01-21 | — | — | CN | disclosed |
| WO-2013175085-A1 | PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON AND SELECTIVE HYDROGENATION PROCESS USING SAID CATALYST | IFP Energies Nouvelles (FR) | 2013-11-28 | — | — | WO | disclosed |