SCHEMBL1554737

SCHEMBL1554737

Cc1ccc(C(c2ccc(C)cc2N)(C(F)(F)F)C(F)(F)F)c(N)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.52
TDP1 Q9NUW8 2/20 0.48
ALOX15 P16050 2/20 0.48
CYP3A4 P08684 2/20 0.48
TP53 P04637 1/20 0.48
THRB P10828 1/20 0.48
ALDH1A1 P00352 4/20 0.46
HSD17B10 Q99714 1/20 0.43
CA1 P00915 1/20 0.42
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
KIF11 P52732 1/20 0.34
FFAR4 Q5NUL3 1/20 0.33
TSHR P16473 1/20 0.33
MAPT P10636 1/20 0.32
PKM P14618 1/20 0.32
MAPK1 P28482 1/20 0.32
ATM Q13315 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CYP1A2 P05177 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29752043 1.00 SMN1; SMN2 (0.52) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL29441420 0.83 SMN1; SMN2 (0.52) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL2748456 0.83 SMN1; SMN2 (0.52) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL6834136 0.81 SMN1; SMN2 (0.50) SMN1; SMN2TDP1ALOX15CYP3A4TP53
Hydrochloric Acid SCHEMBL27738830 0.81 SMN1; SMN2 (0.50) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL28243345 0.80 SMN1; SMN2 (0.49) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL3672163 0.79 SMN1; SMN2 (0.48) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL15607664 0.78 SMN1; SMN2 (0.41) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL10839049 0.76 TDP1 (0.54) SMN1; SMN2TDP1ALOX15CYP3A4TP53
SCHEMBL12737452 0.76 SMN1; SMN2 (0.54) SMN1; SMN2TDP1ALOX15CYP3A4TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11414545-B2 Resin composition INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2022-08-16 US claimed
WO-2022142305-A1 COLORLESS TRANSPARENT POLYIMIDE THIN FILM AND PREPARATION METHOD THEREFOR, AND LED FILM SCREEN 宁波长阳科技股份有限公司 2022-07-07 WO claimed
US-20210115251-A1 RESIN COMPOSITION INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2021-04-22 US claimed
US-10941294-B2 Resin composition INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2021-03-09 US claimed
US-20190169434-A1 RESIN COMPOSITION INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2019-06-06 US claimed
US-10239999-B2 Curable resin, spacer composition, filter, methods of preparing the same, and display device BOE TECHNOLOGY GROUP CO., LTD. (CN) 2019-03-26 US claimed
US-10007031-B2 Mobile equipment protective sleeve, mobile equipment BOE TECHNOLOGY GROUP CO., LTD. (CN) 2018-06-26 US claimed
US-9587121-B2 Functional material and preparation method thereof, resin composition, film, and display device BOE TECHNOLOGY GROUP CO., LTD. (CN) 2017-03-07 US claimed
US-20170023706-A1 MOBILE EQUIPMENT PROTECTIVE SLEEVE, MOBILE EQUIPMENT BOE TECHNOLOGY GROUP CO., LTD. (CN) 2017-01-26 US claimed
US-20160251526-A1 FUNCTIONAL MATERIAL AND PREPARATION METHOD THEREOF, RESIN COMPOSITION, FILM, AND DISPLAY DEVICE BOE TECHNOLOGY GROUP CO., LTD. (CN) 2016-09-01 US claimed
US-20160208049-A1 CURABLE RESIN, SPACER COMPOSITION, FILTER, METHODS OF PREPARING THE SAME, AND DISPLAY DEVICE BOE TECHNOLOGY GROUP CO., LTD. 2016-07-21 US claimed
US-6927012-B2 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-09 US claimed
EP-4629280-A1 COMPOSITION FOR FORMING COATING FILM FOR FOREIGN SUBSTANCE REMOVAL, AND SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2025-10-08 EP disclosed
WO-2025047702-A1 COMPOSITION FOR PATTERNING AND USE OF SAME 日産化学株式会社 2025-03-06 WO disclosed
WO-2025047700-A1 COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF 日産化学株式会社 2025-03-06 WO disclosed
WO-2024214539-A1 COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND 日産化学株式会社 2024-10-17 WO disclosed
EP-1431822-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2004-06-23 EP disclosed
EP-1411088-A1 POLYAMIC ACID RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2004-04-21 EP disclosed
US-20040048188-A1 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-11 US disclosed
EP-1329769-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-07-23 EP disclosed