SCHEMBL15615110

SCHEMBL15615110

C=C(C)C(=O)Oc1ccc(O)c(C(C)(C(F)(F)F)C(F)(F)F)c1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 1/20 0.43
▸ MAPT P10636 1/20 0.43
▸ NR1H4 Q96RI1 7/20 0.42
▸ ATM Q13315 3/20 0.42
▸ ESRRA P11474 3/20 0.42
▸ GAA P10253 1/20 0.41
▸ XBP1 P17861 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ ELANE P08246 1/20 0.41
▸ KMT2A Q03164 2/20 0.39
▸ ALDH1A1 P00352 1/20 0.38
▸ CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15581662 0.88 HSP90AA1 (0.43) POLBMAPTNR1H4ATMESRRA
SCHEMBL26793677 0.87 ELANE (0.44) POLBMAPTNR1H4ATMESRRA
SCHEMBL14329292 0.86 ELANE (0.41) POLBMAPTNR1H4ATMESRRA
SCHEMBL16544028 0.85 ESRRA (0.56) POLBMAPTNR1H4ATMESRRA
SCHEMBL16544027 0.81 ATM (0.44) POLBMAPTNR1H4ATMESRRA
SCHEMBL15836482 0.80 ELANE (0.40) POLBMAPTNR1H4ATMESRRA
SCHEMBL15836530 0.78 ELANE (0.46) POLBMAPTATMELANEKMT2A
SCHEMBL25873039 0.78 ELANE (0.50) MAPTATMNPSR1L3MBTL1ELANE
SCHEMBL15840342 0.78 ELANE (0.41) POLBMAPTATMELANEKMT2A
SCHEMBL15388793 0.77 ELANE (0.49) MAPTNR1H4ATMESRRAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762292-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-09-19 — — US disclosed
US-10025181-B2 Polymer composition and photoresist comprising same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-17 — — US disclosed
US-9557642-B2 Photoresist composition and associated method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-01-31 — — US disclosed
US-20160103392-A1 PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-04-14 — — US disclosed
US-9229319-B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-01-05 — — US disclosed
US-9182669-B2 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-11-10 — — US disclosed
US-20150177614-A1 COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 — — US disclosed
US-20150177613-A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 — — US disclosed
US-20140080060-A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 — — US disclosed
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