Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Monoethanolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Monoethanolamine SCHEMBL1331364 | 0.94 | — | — | |
| Monoethanolamine SCHEMBL2351509 | 0.94 | — | — | |
| Monoethanolamine SCHEMBL10941117 | 0.94 | TSHR (1.00) | — | |
| Monoethanolamine SCHEMBL14675689 | 0.94 | TSHR (1.00) | — | |
| Monoethanolamine SCHEMBL1644 | 0.94 | — | — | |
| Monoethanolamine SCHEMBL4937454 | 0.94 | TSHR (1.00) | — | |
| Monoethanolamine SCHEMBL1332111 | 0.94 | — | — | |
| Monoethanolamine SCHEMBL8339880 | 0.94 | TSHR (1.00) | — | |
| Monoethanolamine SCHEMBL22076332 | 0.89 | — | — | |
| Monoethanolamine SCHEMBL20536834 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1099691-C | Electron emission device, electron source and image-forming device mfg. method | CANON KK (JP) | 2003-01-22 | — | — | CN | claimed |
| CN-1162244-A | Electron emission device, electron source and image-forming device mfg. method | CANON KK (JP) | 1997-10-15 | — | — | CN | claimed |
| EP-1119014-B1 | Glass substrate processing method and glass substrate recycling processing method for a flat display | CANON KK (JP) | 2011-04-06 | — | — | EP | disclosed |
| CN-101819911-A | Image display, method for disassembling the same, and method for recovering part | CANON KK | 2010-09-01 | — | — | CN | disclosed |
| CN-101583245-A | Manufacture method for conductive member pattern | CANON KK (JP) | 2009-11-18 | — | — | CN | disclosed |
| CN-100461326-C | Electron-emitting device, electron source, image display apparatus, and their manufacturing method | CANON KK (JP) | 2009-02-11 | — | — | CN | disclosed |
| US-7416462-B2 | Glass substrate processing method and material removal process using x-ray fluorescence | CANON KABUSHIKI KAISHA (JP) | 2008-08-26 | — | — | US | disclosed |
| CN-100377278-C | Method for disassembling display | CANON KK (JP) | 2008-03-26 | — | — | CN | disclosed |
| CN-100351980-C | Image display device and dissection processing method and element recovery method | CANON KK (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-1870207-A | Image display apparatus, disassembly processing method therefor, and component recovery method | CANON KK (JP) | 2006-11-29 | — | — | CN | disclosed |
| CN-1252329-C | Carbon fiber mfg. method and its use, and ink for producing catalyst | CANON KK (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1115708-C | Method of manufacturing electron-emitting device, electron source and image-forming apparatus using the same | CANON KK (JP) | 2003-07-23 | — | — | CN | disclosed |
| CN-1106658-C | Electron-emitting apparatus, image-forming apparatus using the same, and manufacturing method therefor | CANON KK (JP) | 2003-04-23 | — | — | CN | disclosed |
| CN-1099691-C | Electron emission device, electron source and image-forming device mfg. method | CANON KK (JP) | 2003-01-22 | — | — | CN | disclosed |
| CN-1316094-A | Image display device, disassembly processing method thereof, and component recovery method | CANON KK (JP) | 2001-10-03 | — | — | CN | disclosed |
| EP-1119014-A1 | IMAGE DISPLAY, METHOD FOR DISASSEMBLING THE SAME, AND METHOD FOR RECOVERING PART | CANON KABUSHIKI KAISHA (JP) | 2001-07-25 | — | — | EP | disclosed |
| CN-1204850-A | Production processes of printed substrate, electron-emitting element, electron source and image-forming apparatus | CANON KK (JP) | 1999-01-13 | — | — | CN | disclosed |
| CN-1176477-A | Electron-emitting apparatus, image-forming apparatus using the same, and manufacturing method therefor | CANON KK (JP) | 1998-03-18 | — | — | CN | disclosed |
| CN-1174400-A | Method of manufacturing electron-emitting device, electron source and image-forming apparatus using the same | CANON KK (JP) | 1998-02-25 | — | — | CN | disclosed |
| CN-1162244-A | Electron emission device, electron source and image-forming device mfg. method | CANON KK (JP) | 1997-10-15 | — | — | CN | disclosed |