SCHEMBL157888

SCHEMBL157888

CC(=CC1=CCCCC1)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.41
HDAC4 P56524 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
APEX1 P27695 8/20 0.33
GSTP1 P09211 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33
CTSK P43235 1/20 0.33
HCAR2 Q8TDS4 1/20 0.32
ACMSD Q8TDX5 1/20 0.31
PIN1 Q13526 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2937034 1.00 AKR1C3 (0.41) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL155075 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL8080804 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL7994473 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL7994476 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL155074 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL156064 0.98 AKR1C3 (0.40) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL154779 0.94 AKR1C3 (0.42) AKR1C3HDAC4HDAC2HDAC8HDAC6
Methacrylic Acid SCHEMBL29517035 0.92 AKR1C3 (0.36) AKR1C3HDAC4HDAC2HDAC8HDAC6
SCHEMBL11593878 0.87 HDAC4 (0.36) HDAC4HDAC2HDAC8HDAC6GSTP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476404-B1 Method, means and kit for infiltrating enamel lesions CHARITÉ UNIVERSITÄTSMEDIZIN BERLIN (DE) 2017-03-22 EP claimed
EP-2023884-B1 METHOD AND MEANS FOR INFILTRATING ENAMEL LESIONS CHARITÉ UNIVERSITÄTSMEDIZIN BERLIN (DE) 2017-03-22 EP claimed
EP-1854445-B1 Method and means for infiltrating enamel lesions CHARITE UNIVERSITAETSMEDIZIN (DE) 2010-09-15 EP claimed
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
CN-117304138-A Method for preparing epoxy compound by using micro-flux continuous flow reactor 江苏泰特尔新材料科技股份有限公司 2023-12-29 CN disclosed
US-10385268-B2 Photosensitive resin composition and display device SAMSUNG DISPLAY CO., LTD. (KR) 2019-08-20 US disclosed
EP-3428240-A1 WATER-BASED COATING COMPOSITION Kansai Paint Co., Ltd (JP) 2019-01-16 EP disclosed
EP-2633567-B1 OPTO-ELECTRIC DEVICE AND METHOD OF MANUFACTURING AN OPTO-ELECTRIC DEVICE NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 2017-11-08 EP disclosed
US-9788420-B2 Substrate and touch panel member using same TORAY INDUSTRIES, INC. (JP) 2017-10-10 US disclosed
US-9690197-B2 Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method TORAY INDUSTRIES, INC. (JP) 2017-06-27 US disclosed
US-9637683-B2 Photosensitive resin composition and display device SAMSUNG DISPLAY CO., LTD. (KR) 2017-05-02 US disclosed
US-20100227077-A1 BRUSH POLYMER COATING BY IN SITU POLYMERIZATION FROM PHOTOREACTIVE SURFACE INNOVATIVE SURFACE TECHNOLOGIES, LLC. 2010-09-09 US disclosed
US-7576139-B2 Coating composition and method of forming coating film KANSAI PAINT CO., LTD. (JP) 2009-08-18 US disclosed
US-7307178-B2 Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-11 US disclosed
US-20070054977-A1 Coating composition and method of forming coating film KANSAI PAINT CO., LTD. (JP) 2007-03-08 US disclosed
US-20060135678-A1 Aqueous amino resin dispersions and thermosetting water-based paint compositions KANSAI PAINT CO., LTD. (JP) 2006-06-22 US disclosed
US-20050070729-A1 Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-31 US disclosed
WO-2004107470-A1 ORGANIC ELECTRONIC DEVICE OSRAM OPTO SEMICONDUCTORS GMBH (DE) 2004-12-09 WO disclosed
WO-2004107468-A2 FLEXIBLE MULTILAYER PACKAGING MATERIAL AND ELECTRONIC DEVICES WITH THE PACKAGING MATERIAL OSRAM OPTO SEMICONDUCTORS GMBH (DE) 2004-12-09 WO disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050070729-A1 Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making DEGS1, EBP, FASN AKR1C3 1011/4885HDAC4 2928/4885HDAC2 3025/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.