SCHEMBL1583531

SCHEMBL1583531

CC[Al](CC)CC.C[Al](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27396932 1.00
SCHEMBL9202049 0.89
SCHEMBL8144244 0.89
SCHEMBL17221 0.89
Phosphine SCHEMBL8155632 0.84
SCHEMBL9561672 0.84
SCHEMBL465445 0.84
SCHEMBL3113700 0.84
SCHEMBL18050339 0.84
Hydrochloric Acid SCHEMBL786322 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115975080-A Magnesium-titanium-containing catalyst component for ethylene polymerization, catalyst and ethylene polymerization reaction method 中国石油化工股份有限公司 2023-04-18 CN claimed
US-7232872-B2 Polymerization processes EXXONMOBIL CHEMICAL PATENTS INC. (US) 2007-06-19 US claimed
EP-3594219-B1 ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME VERSUM MAT US LLC (US) 2023-01-25 EP disclosed
CN-114907509-A Alpha-olefin-cycloolefin copolymer and preparation method and application thereof 中国石油化工股份有限公司 2022-08-16 CN disclosed
US-20210180211-A1 GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE FURUKAWA CO., LTD. (JP) 2021-06-17 US disclosed
US-20210170380-A1 MAGNESIUM DICHLORIDE-ALCOHOL ADDUCTS AND CATALYST COMPONENTS OBTAINED THEREFROM BASELL POLIOLEFINE ITALIA S.R.L. (IT) 2021-06-10 US disclosed
US-11011374-B2 Group III nitride semiconductor substrate and method for manufacturing group III nitride semiconductor substrate FURUKAWA CO., LTD. (JP) 2021-05-18 US disclosed
EP-3339312-B1 ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME VERSUM MAT US LLC (US) 2021-05-12 EP disclosed
EP-3724240-A1 MAGNESIUM DICHLORIDE-ALCOHOL ADDUCTS AND CATALYST COMPONENTS OBTAINED THEREFROM Basell Poliolefine Italia S.r.l. (IT) 2020-10-21 EP disclosed
US-20200132750-A1 GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE FURUKAWA CO., LTD. (JP) 2020-04-30 US disclosed
US-20200058490-A1 GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE FURUKAWA CO., LTD. (JP) 2020-02-20 US disclosed
US-4937217-A BY ADDING UNDEHYDRATED SILICA GEL AND METALLOCENE; DRYING EXXON CHEMICAL PATENTS INC. (US) 1990-06-26 US disclosed
EP-0367503-A1 Method for utilizing triethylaluminum to prepare an alumoxane support for an active metallocene catalyst EXXON CHEMICAL PATENTS INC. (US) 1990-05-09 EP disclosed
US-4762898-A Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1988-08-09 US disclosed
EP-0197311-A2 Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-10-15 EP disclosed
EP-0012397-B1 POLYMERIZATION CATALYST AND PROCESS FOR POLYMERIZING ALPHA-OLEFINS PHILLIPS PETROLEUM COMPANY (US) 1984-02-15 EP disclosed
EP-0070039-A2 Polymerization catalyst and process for polymerizing alpha-olefins PHILLIPS PETROLEUM COMPANY (US) 1983-01-19 EP disclosed
EP-0068799-A2 Titanium trichloride catalyst component and the process for the production thereof EXXON RESEARCH AND ENGINEERING COMPANY (US) 1983-01-05 EP disclosed
US-4364873-A VANADIUM-BASED CATALYST ETHYL CORPORATION (US) 1982-12-21 US disclosed
EP-0012397-A1 Polymerization catalyst and process for polymerizing alpha-olefins PHILLIPS PETROLEUM COMPANY (US) 1980-06-25 EP disclosed