SCHEMBL15845002

SCHEMBL15845002

C=C(CC1(C)CCCC1=C)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.32
GRIK2 Q13002 1/20 0.32
HAO1 Q9UJM8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15845107 0.95
SCHEMBL15844831 0.72
SCHEMBL15844847 0.72 APOBEC3A (0.31)
SCHEMBL5897821 0.70 CYP2C19 (0.34) GRIK1GRIK2
SCHEMBL7964764 0.70 TET2 (0.33) GRIK1GRIK2
SCHEMBL1334944 0.68 CYP2C19 (0.38)
SCHEMBL7976321 0.68 CYP2C19 (0.38)
SCHEMBL7978219 0.68 CYP2C19 (0.38)
SCHEMBL3170394 0.67 FFAR3 (0.34)
SCHEMBL9342145 0.66 FFAR3 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465291-B2 Radiation-sensitive resin composition, polymer, compound, and method for producing compound JSR CORPORATION (JP) 2016-10-11 US disclosed
US-20140186771-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2014-07-03 US disclosed