⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15915183 | 0.83 | — | — | |
| SCHEMBL8566693 | 0.82 | — | — | |
| SCHEMBL27940228 | 0.80 | — | — | |
| SCHEMBL407583 | 0.80 | — | — | |
| SCHEMBL15533446 | 0.80 | — | — | |
| SCHEMBL28227557 | 0.80 | PTPN1 (0.32) | — | |
| SCHEMBL4021598 | 0.80 | — | — | |
| SCHEMBL30661142 | 0.80 | PTPN1 (0.32) | — | |
| SCHEMBL23828665 | 0.78 | PTPN1 (0.31) | — | |
| SCHEMBL1628589 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9970103-B2 | Film deposition material, sealing film using the same and use thereof | TOSOH CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160326642-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20140219903-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2014-08-07 | — | — | US | disclosed |