⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15915180 | 1.00 | — | — | |
| SCHEMBL15915104 | 1.00 | — | — | |
| SCHEMBL15914938 | 0.79 | — | — | |
| SCHEMBL15914674 | 0.79 | — | — | |
| SCHEMBL15914465 | 0.70 | — | — | |
| SCHEMBL15914968 | 0.70 | — | — | |
| SCHEMBL15915078 | 0.70 | — | — | |
| SCHEMBL609840 | 0.65 | — | — | |
| SCHEMBL27347350 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL1539665 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9970103-B2 | Film deposition material, sealing film using the same and use thereof | TOSOH CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20160326642-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20140219903-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2014-08-07 | — | — | US | disclosed |