SCHEMBL15926224

SCHEMBL15926224

CCC(O[Si](C)(C)C(C)(CC)O[SiH](C)C)[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15800197 0.88
SCHEMBL15580421 0.83
SCHEMBL16230328 0.81
SCHEMBL15304094 0.81
SCHEMBL14930435 0.81
SCHEMBL16526741 0.78
SCHEMBL19286976 0.76
SCHEMBL15120516 0.76
SCHEMBL14846049 0.76
SCHEMBL17340684 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170275438-A1 MAGNETO-RHEOLOGICAL ELASTOMER COMPOSITION, METHOD FOR PRODUCING SAME, AND VIBRATION ABSORBING DEVICE INCLUDING SAME FUJI POLYMER INDUSTRIES CO., LTD. (JP) 2017-09-28 US disclosed
US-8796410-B2 Polymer having silphenylene and siloxane structures, a method of preparing the same, an adhesive composition, an adhesive sheet, a protective material for a semiconductor device, and a semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-05 US disclosed