⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3403009 | 0.92 | TSHR (0.30) | — | |
| SCHEMBL28021704 | 0.88 | MEN1 (0.32) | — | |
| SCHEMBL30853262 | 0.88 | — | — | |
| SCHEMBL1626110 | 0.85 | — | — | |
| SCHEMBL9556112 | 0.84 | — | — | |
| SCHEMBL1593153 | 0.82 | — | — | |
| SCHEMBL3402992 | 0.82 | — | — | |
| SCHEMBL11610306 | 0.79 | — | — | |
| SCHEMBL7866423 | 0.79 | — | — | |
| SCHEMBL1326548 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250357545-A1 | ETHER ELECTROLYTE SOLUTION AND APPLICATION OF ETHER ELECTROLYTE SOLUTION IN BATTERIES | UNIV SCIENCE & TECHNOLOGY CHINA (CN) | 2025-11-20 | — | — | US | claimed |
| CN-117619158-B | Pore-diameter-adjustable polyether sulfone ultrafiltration membrane and preparation method and application thereof | 自然资源部天津海水淡化与综合利用研究所 | 2024-04-12 | — | — | CN | claimed |
| CN-117619158-A | Pore-diameter-adjustable polyether sulfone ultrafiltration membrane and preparation method and application thereof | 自然资源部天津海水淡化与综合利用研究所 | 2024-03-01 | — | — | CN | claimed |
| WO-2023236664-A1 | USE OF FLUOROETHER SOLVENT AND ELECTROLYTE IN ENERGY STORAGE BATTERIES | 中国科学技术大学 | 2023-12-14 | — | — | WO | claimed |
| CN-115084656-A | Ether electrolyte and application thereof in battery | 中国科学技术大学 | 2022-09-20 | — | — | CN | claimed |
| US-20250357545-A1 | ETHER ELECTROLYTE SOLUTION AND APPLICATION OF ETHER ELECTROLYTE SOLUTION IN BATTERIES | UNIV SCIENCE & TECHNOLOGY CHINA (CN) | 2025-11-20 | — | — | US | disclosed |
| CN-117619158-B | Pore-diameter-adjustable polyether sulfone ultrafiltration membrane and preparation method and application thereof | 自然资源部天津海水淡化与综合利用研究所 | 2024-04-12 | — | — | CN | disclosed |
| CN-117619158-A | Pore-diameter-adjustable polyether sulfone ultrafiltration membrane and preparation method and application thereof | 自然资源部天津海水淡化与综合利用研究所 | 2024-03-01 | — | — | CN | disclosed |
| WO-2023236664-A1 | USE OF FLUOROETHER SOLVENT AND ELECTROLYTE IN ENERGY STORAGE BATTERIES | 中国科学技术大学 | 2023-12-14 | — | — | WO | disclosed |
| CN-115084656-A | Ether electrolyte and application thereof in battery | 中国科学技术大学 | 2022-09-20 | — | — | CN | disclosed |
| US-8741538-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741538-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-7700259-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-7700259-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-20090081580-A1 | COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090081580-A1 | COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1736485-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-0049144-A1 | 5-Fluoro uracil derivatives | BEECHAM GROUP PLC (GB) | 1982-04-07 | — | — | EP | disclosed |