SCHEMBL1593359

SCHEMBL1593359

OC1CCC(O)CCC(O)CC1

nearest known ligand 0.64

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.64
EPHX2 P34913 1/20 0.44
SHBG P04278 1/20 0.42
ESR2 Q92731 2/20 0.38
GPR119 Q8TDV5 1/20 0.37
LMNA P02545 3/20 0.32
CYP2C9 P11712 1/20 0.32
THRB P10828 1/20 0.31
APP P05067 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL102859 1.00
SCHEMBL2700308 1.00 TSHR (0.64) TSHREPHX2SHBGESR2GPR119
SCHEMBL275681 1.00
SCHEMBL3389566 1.00 TSHR (0.64) TSHREPHX2SHBGESR2GPR119
SCHEMBL28182 1.00
SCHEMBL8036941 1.00 TSHR (0.64) TSHREPHX2SHBGESR2GPR119
Methane SCHEMBL113282 0.94 TSHR (0.58) TSHREPHX2SHBGESR2GPR119
SCHEMBL27981926 0.94
SCHEMBL9579988 0.94 TSHR (0.58) TSHREPHX2SHBGESR2GPR119
SCHEMBL8611 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8900472-B2 Texturing and cleaning agent for the surface treatment of wafers and use thereof Fraunhofer-Gesellschaft zur Föerderung der Angewandten Forschung E.V. (DE) 2014-12-02 US claimed
EP-2229431-B1 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF FRAUNHOFER GES FORSCHUNG (DE) 2013-02-20 EP claimed
US-20110092074-A1 Texturing and cleaning agent for the surface treatment of wafers and use thereof FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2011-04-21 US claimed
EP-2229431-A2 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2010-09-22 EP claimed
WO-2009071333-A2 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2009-06-11 WO claimed
US-8900472-B2 Texturing and cleaning agent for the surface treatment of wafers and use thereof Fraunhofer-Gesellschaft zur Föerderung der Angewandten Forschung E.V. (DE) 2014-12-02 US disclosed
EP-2229431-B1 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF FRAUNHOFER GES FORSCHUNG (DE) 2013-02-20 EP disclosed
US-8158728-B2 Methods and materials for fabricating microfluidic devices THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2012-04-17 US disclosed
US-20110092074-A1 Texturing and cleaning agent for the surface treatment of wafers and use thereof FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2011-04-21 US disclosed
EP-2229431-A2 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2010-09-22 EP disclosed
US-20090281250-A1 METHODS AND MATERIALS FOR FABRICATING MICROFLUIDIC DEVICES THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2009-11-12 US disclosed
WO-2009071333-A2 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 2009-06-11 WO disclosed