⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13011920 | 0.88 | — | — | |
| SCHEMBL15934945 | 0.87 | — | — | |
| SCHEMBL10099530 | 0.84 | — | — | |
| SCHEMBL15935533 | 0.82 | — | — | |
| SCHEMBL15935525 | 0.78 | — | — | |
| SCHEMBL16372903 | 0.76 | — | — | |
| SCHEMBL13554286 | 0.75 | — | — | |
| SCHEMBL12650111 | 0.74 | — | — | |
| SCHEMBL13011339 | 0.74 | — | — | |
| SCHEMBL13011340 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140220492-A1 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |