⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12446698 | 0.88 | — | — | |
| SCHEMBL12170559 | 0.88 | — | — | |
| SCHEMBL10098836 | 0.88 | — | — | |
| SCHEMBL15934946 | 0.87 | — | — | |
| SCHEMBL15146975 | 0.84 | — | — | |
| SCHEMBL19558210 | 0.84 | — | — | |
| SCHEMBL546903 | 0.84 | — | — | |
| SCHEMBL12019918 | 0.84 | — | — | |
| SCHEMBL18789427 | 0.84 | — | — | |
| SCHEMBL22590266 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140220492-A1 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |