SCHEMBL15939627

SCHEMBL15939627

C=CCCC(=O)CC(=O)C(=O)O

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HAO1 Q9UJM8 2/20 0.45
MAPT P10636 2/20 0.40
ABCC4 O15439 1/20 0.40
ALDH1A1 P00352 3/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 2/20 0.33
OR51E2 Q9H255 2/20 0.33
SLC13A3 Q8WWT9 1/20 0.33
EGLN1 Q9GZT9 1/20 0.33
TSHR P16473 2/20 0.31
ALOX15 P16050 1/20 0.31
HSD17B10 Q99714 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
PTPN1 P18031 1/20 0.30
ERCC5 P28715 1/20 0.30
FEN1 P39748 1/20 0.30
NPC1 O15118 1/20 0.30
FAAH O00519 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL123903 0.81 MAPT (0.48) MAPTABCC4ALDH1A1LMNAEGLN1
SCHEMBL7199512 0.80
SCHEMBL11134152 0.77 CA4 (0.39) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL5879475 0.77 CA4 (0.39) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL14799957 0.77 CA4 (0.39) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL14799997 0.77 CA4 (0.39) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL1682021 0.77 CA4 (0.39) MAPTABCC4ALDH1A1LMNATSHR
SCHEMBL296964 0.77 MAPT (0.46) MAPTABCC4ALDH1A1LMNAMAPK1
SCHEMBL7219664 0.76 HAO1 (0.39) HAO1ALDH1A1LMNAMAPK1OR51E2
SCHEMBL1973008 0.74 KDM4E (0.50) MAPTABCC4ALDH1A1LMNAEGLN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2754638-B1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX TOSOH CORP (JP) 2018-11-07 EP disclosed
US-9371452-B2 Film-forming material, group IV metal oxide film and vinylenediamide complex TOSOH CORPORATION (JP) 2016-06-21 US disclosed
US-20140227456-A1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2014-08-14 US disclosed