SCHEMBL15939769

SCHEMBL15939769

C[Zr](C)(C)(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL179717 0.71
SCHEMBL28113749 0.61
Hydrochloric Acid SCHEMBL301375 0.61
SCHEMBL10868623 0.61
Iodide SCHEMBL4652804 0.61
SCHEMBL28276419 0.50
SCHEMBL908 0.47
SCHEMBL15788 0.47
SCHEMBL23039179 0.41
SCHEMBL7890376 0.41

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105022227-B Curable adhensive compositions, the manufacturing method of hardening thing, hardening thing, cured film and display device 富士胶片株式会社 2019-11-05 CN disclosed
CN-105895195-B Electrically conducting transparent component laminated body, transfer materials, electrically conducting transparent component, touch screen and its manufacturing method and its application 富士胶片株式会社 2019-06-25 CN disclosed
EP-2754638-B1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX TOSOH CORP (JP) 2018-11-07 EP disclosed
CN-105001254-B The manufacturing method of film material, IV family metal oxide films 东曹株式会社 2018-09-11 CN disclosed
CN-105895195-A Layered body for transparent conductive member, transfer material, transparent conductive member, touch panel and process for producing same, and application thereof 富士胶片株式会社 2016-08-24 CN disclosed
US-9371452-B2 Film-forming material, group IV metal oxide film and vinylenediamide complex TOSOH CORPORATION (JP) 2016-06-21 US disclosed
CN-105001254-A Manufacturing methods for film-forming material, group IV metal oxide film TOSOH CORP 2015-10-28 CN disclosed
US-20140227456-A1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2014-08-14 US disclosed
CN-103917487-A Film-forming material, group IV metal oxide film, and vinylidene diamide complex TOSOH CORP 2014-07-09 CN disclosed