SCHEMBL15946333

SCHEMBL15946333

CC[Si](C)(C)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)O[Si](C)(CC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1702003 0.89
SCHEMBL2491093 0.89
SCHEMBL13513587 0.87
SCHEMBL1001511 0.87
SCHEMBL13227998 0.83
SCHEMBL14106711 0.77
SCHEMBL94015 0.74
SCHEMBL15166509 0.74
SCHEMBL6703191 0.74
SCHEMBL12140493 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9048175-B2 Diffusion-agent composition for forming an impurity-diffusing agent layer on a semiconductor substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2015-06-02 US disclosed
US-20140227865-A1 DIFFUSION-AGENT COMPOSITION, METHOD FOR FORMING IMPURITY-DIFFUSION LAYER, AND SOLAR CELL TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-14 US disclosed