⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481979 | 0.85 | — | — | |
| SCHEMBL8680811 | 0.81 | TSHR (0.39) | — | |
| SCHEMBL3481423 | 0.78 | — | — | |
| SCHEMBL1595968 | 0.77 | — | — | |
| SCHEMBL1514223 | 0.77 | — | — | |
| SCHEMBL17239114 | 0.77 | — | — | |
| SCHEMBL3482452 | 0.75 | — | — | |
| SCHEMBL28036010 | 0.73 | — | — | |
| SCHEMBL27776525 | 0.72 | — | — | |
| SCHEMBL5881449 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116203800-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-116203800-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-06-02 | — | — | CN | disclosed |
| EP-1870439-B1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL CORP (JP) | 2018-10-03 | — | — | EP | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-101641767-B | Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device | FUJITSU LTD | 2013-10-30 | — | — | CN | disclosed |
| US-7919016-B2 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20100207076-A1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-7718708-B2 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20070297966-A1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| EP-1870439-A2 | Conductive tin oxide sol and process for producing same | Nissan Chemical Industries, Ltd. (JP) | 2007-12-26 | — | — | EP | disclosed |
| EP-1491503-B1 | Metal oxide particle comprising the metals tin, zinc and antimony and process for producing same | NISSAN CHEMICAL IND LTD (JP) | 2007-09-26 | — | — | EP | disclosed |
| EP-1589078-B1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL IND LTD (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-7157024-B2 | Metal oxide particle and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-20050239907-A1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1589078-A1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2005-10-26 | — | — | EP | disclosed |
| US-20050012078-A1 | Metal oxide particle and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-20 | — | — | US | disclosed |