Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL106940 | 0.84 | EPHX2 (0.36) | EPHX2ALDH1A1GRM1HPGD | |
| SCHEMBL19214553 | 0.82 | — | — | |
| SCHEMBL19214552 | 0.82 | — | — | |
| SCHEMBL107020 | 0.80 | EPHX2 (0.37) | EPHX2ALDH1A1GRM1HPGD | |
| SCHEMBL13496185 | 0.80 | EPHX2 (0.33) | EPHX2GRM1 | |
| SCHEMBL6368317 | 0.79 | EPHX2 (0.37) | EPHX2ALDH1A1GRM1HPGD | |
| SCHEMBL15960978 | 0.79 | — | — | |
| SCHEMBL19497268 | 0.79 | KMT2A (0.37) | EPHX2ALDH1A1HPGD | |
| SCHEMBL9608692 | 0.79 | KMT2A (0.37) | EPHX2ALDH1A1HPGD | |
| SCHEMBL19220815 | 0.77 | EPHX2 (0.31) | EPHX2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20140234759-A1 | ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |