Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ELANE | P08246 | 6/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | F2 | P00734 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18434906 | 0.86 | HTT (0.37) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL18356710 | 0.85 | NPC1 (0.40) | HTTKMT2ASMN1; SMN2TDP1POLB | |
| SCHEMBL18356798 | 0.84 | MEN1 (0.45) | HTTKMT2ASMN1; SMN2POLBTSHR | |
| SCHEMBL22261439 | 0.82 | TDP1 (0.44) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL14817249 | 0.82 | KMT2A (0.49) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL14665293 | 0.81 | KMT2A (0.47) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL15978728 | 0.78 | NPSR1 (0.46) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL18356937 | 0.78 | KMT2A (0.40) | HTTKMT2ASMN1; SMN2TDP1ELANE | |
| SCHEMBL14884055 | 0.78 | ELANE (0.41) | ELANEHPGD | |
| SCHEMBL26261372 | 0.77 | ELANE (0.53) | HTTKMT2ASMN1; SMN2TDP1ELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170005266-A1 | SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-9400430-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20140242502-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |