SCHEMBL16074776

SCHEMBL16074776

CC(O)(CCCO)CCCCCCCCO

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.43
CYP4A11 Q02928 2/20 0.43
ALDH1A1 P00352 3/20 0.43
LMNA P02545 2/20 0.43
HSD17B10 Q99714 1/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
TSHR P16473 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.38
ALOX15 P16050 1/20 0.35
TDP1 Q9NUW8 2/20 0.34
FFAR1 O14842 2/20 0.33
CPT2 P23786 1/20 0.33
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
GPR84 Q9NQS5 1/20 0.32
FFAR4 Q5NUL3 1/20 0.32
KDM4E B2RXH2 1/20 0.31
FDPS P14324 4/20 0.30
GGPS1 O95749 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16074859 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074734 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074764 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074743 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074829 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074724 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074792 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074813 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074873 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074939 1.00 CYP4F2 (0.43) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed