SCHEMBL16074841

SCHEMBL16074841

CC(C)(O)CC(O)CCCCCCCCCCCCCO

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ACACB O00763 1/20 0.38
ACACA Q13085 1/20 0.38
PSMD14 O00487 2/20 0.34
PLA2G1B P04054 2/20 0.34
MMP2 P08253 2/20 0.34
ATG4B Q9Y4P1 2/20 0.34
HSP90AA1 P07900 1/20 0.34
RAD52 P43351 1/20 0.34
LMNA P02545 2/20 0.33
ALDH1A1 P00352 1/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TSHR P16473 1/20 0.33
PTPN1 P18031 1/20 0.33
GPR84 Q9NQS5 4/20 0.31
FFAR4 Q5NUL3 1/20 0.31
FFAR1 O14842 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16074928 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074702 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074761 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074936 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074839 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074849 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074742 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074871 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074781 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2
SCHEMBL16074895 1.00 ACACB (0.38) ACACBACACAPSMD14PLA2G1BMMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed