SCHEMBL16077463

SCHEMBL16077463

CC(O)(CCO)CCCCCCCCCCCCCO

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.41
CYP4A11 Q02928 2/20 0.41
ALDH1A1 P00352 3/20 0.39
LMNA P02545 2/20 0.39
HSD17B10 Q99714 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
TSHR P16473 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.35
ALOX15 P16050 1/20 0.33
TDP1 Q9NUW8 2/20 0.32
FFAR1 O14842 1/20 0.31
CPT2 P23786 1/20 0.31
CNR1 P21554 1/20 0.31
CNR2 P34972 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16074957 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL6260682 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074887 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074843 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074704 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074744 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074924 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074916 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074712 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10
SCHEMBL16074795 1.00 CYP4F2 (0.41) CYP4F2CYP4A11ALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed