Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.50 |
| ▸ | HPGD | P15428 | 4/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | THRB | P10828 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | APP | P05067 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | CASP1 | P29466 | 1/20 | 0.50 |
| ▸ | SNCA | P37840 | 1/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.50 |
| ▸ | IDO1 | P14902 | 2/20 | 0.45 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.40 |
| ▸ | PIM1 | P11309 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | CDK2 | P24941 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30849786 | 1.00 | HSD17B10 (0.50) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL22170101 | 1.00 | HSD17B10 (0.50) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL29362339 | 0.89 | HPGD (0.55) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL29571791 | 0.89 | HPGD (0.55) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL218996 | 0.89 | HPGD (0.55) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL8337349 | 0.87 | HPGD (0.52) | HSD17B10HPGDTSHRTHRBTDP1 | |
| Methane SCHEMBL28526267 | 0.87 | HPGD (0.52) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL7744427 | 0.87 | HPGD (0.52) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL7744429 | 0.87 | HPGD (0.52) | HSD17B10HPGDTSHRTHRBTDP1 | |
| SCHEMBL27927698 | 0.87 | HPGD (0.52) | HSD17B10HPGDTSHRTHRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122037164-A | Polyaryletherketone sequence copolymer, preparation method thereof and application thereof in 3D printing | 吉林大学 | 2026-05-15 | — | — | CN | claimed |
| CN-116072855-B | Silicon-carbon negative electrode material and preparation method thereof | 中国科学院成都有机化学有限公司 | 2025-06-17 | — | — | CN | claimed |
| CN-116072855-A | Silicon-carbon negative electrode material and preparation method thereof | 中国科学院成都有机化学有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-114805789-B | 3D printing polyether-ether-ketone interlayer reinforcing material, preparation method thereof and 3D printing forming method | 吉林大学 | 2023-01-03 | — | — | CN | claimed |
| CN-114805789-A | 3D printing polyether-ether-ketone interlayer reinforcing material, preparation method thereof and 3D printing forming method | 吉林大学 | 2022-07-29 | — | — | CN | claimed |
| CN-113480752-B | Polyether-ether-ketone reinforced master batch and preparation method thereof, and polyether-ether-ketone composite material and preparation method thereof | 吉林大学 | 2022-04-15 | — | — | CN | claimed |
| CN-113480752-A | Polyether-ether-ketone reinforced master batch and preparation method thereof, and polyether-ether-ketone composite material and preparation method thereof | 吉林大学 | 2021-10-08 | — | — | CN | claimed |
| CN-103827126-B | Novel compound and carrier for supporting the same | 株式会社艾迪科 | 2017-05-17 | — | — | CN | claimed |
| CN-122037164-A | Polyaryletherketone sequence copolymer, preparation method thereof and application thereof in 3D printing | 吉林大学 | 2026-05-15 | — | — | CN | disclosed |
| US-20260008931-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | HUNETPLUS CO LTD (KR) | 2026-01-08 | — | — | US | disclosed |
| CN-116072855-B | Silicon-carbon negative electrode material and preparation method thereof | 中国科学院成都有机化学有限公司 | 2025-06-17 | — | — | CN | disclosed |
| EP-4464733-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | Hunetplus Co., Ltd. (KR) | 2024-11-20 | — | — | EP | disclosed |
| CN-118974134-A | Organic polymer, hard mask composition for semiconductor applications comprising the same, and patterning method using the same | 胡网加成股份有限公司 | 2024-11-15 | — | — | CN | disclosed |
| WO-2023214800-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | (주)휴넷플러스 | 2023-11-09 | — | — | WO | disclosed |
| CN-103827126-B | Novel compound and carrier for supporting the same | 株式会社艾迪科 | 2017-05-17 | — | — | CN | disclosed |
| CN-104428907-B | Wavelength conversion layer on glass sheets to improve solar harvesting efficiency | 日东电工株式会社 | 2017-04-12 | — | — | CN | disclosed |
| CN-102574797-B | Benzo [ k ] fluoranthene derivative and organic electroluminescent element containing same | 出光兴产株式会社 | 2017-03-01 | — | — | CN | disclosed |
| US-9416296-B2 | Resist underlayer composition and method for forming pattern using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2016-08-16 | — | — | US | disclosed |
| US-9416296-B2 | Resist underlayer composition and method for forming pattern using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2016-08-16 | — | — | US | disclosed |
| WO-2014157881-A1 | RESIST UNDERLAYER COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | 주식회사 동진쎄미켐 (KR) | 2014-10-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008931-A1 | ORGANIC POLYMER, SEMICONDUCTOR HARD MASK COMPOSITION COMPRISING SAME, AND PATTERNING METHOD USING SAME | ARCN1, RB1, GAR1 | HSD17B10 4075/4885HPGD 4487/4885TSHR 3873/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.